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Статьи в журналах
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- 1998 Investigation of CF3I as an Environmentally Benign Dielectric Etchant
- Levy R.A., Zaitsev V.B., Aryusook K., Sigal V., Misra A., Kesari S., Rufin D., Sees J., Hall L.
- в журнале Journal of Materials Research, издательство Materials Research Society (United States), том 13, № 9, с. 2643-2648 DOI
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- 1998 Plasma etching of dielectric films using the non-global-warming gas CF3I
- Misra A., Sees J., Hall L., Levy R.A., Zaitsev V.B., Aryusook K., Ravindranath C., Sigal V., Kesari S., Rufin D.
- в журнале Materials Letters, издательство Elsevier BV (Netherlands), том 34, с. 415-419 DOI
Статьи в сборниках
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- 1998 The Non Global-Warming Gas, Trifluoroiodomethane, for Plasma Etching of Dielectric Films
- Levy R.A., Zaitsev V.B., Aryusook K., Misra A., Kesari S.
- в сборнике Proceedings of the International Conference Ecology of Cities, место издания Rhodes, Greece, с. 109-113