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Статьи в журналах
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- 2015 Microwave Plasma-Activated Chemical Vapour Deposition of Nitrogen-Doped Diamond, I: N2/H2 and NH3/H2
- Plasmas Benjamin Truscott S.Journal of, Kelly Mark W., Potter Katie J., Mack Johnson, Ashfold Michael N.R., Mankelevich Yuri A.
- в журнале The Journal of Physical Chemistry A: Molecules, Clusters, and Aerosols, издательство American Chemical Society (United States), том 119, с. 12962-12976 DOI